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TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, various Layers, Si

Graphene Oxide film of various thickness, supported by a Silicon Nitride film on a 3mm hexagonal Silicon substrate with 0.5x0.5mm sized aperture. The TEM Grids are available with graphene oxide film of 1 or 2 layers. Ideal for nanoparticle analyses.
Grouped product items
Product Name Qty
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 1 Layer, 5 pieces

E1GOSiN2.5um-5

€413.00 €491.47
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 2 Layer, 10 pieces

E2GOSiN2.5um-10

€766.20 €911.78
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 1 Layer, 10 pieces

E1GOSiN2.5um-10

€787.90 €937.60
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 2 Layer, 25 pieces

E2GOSiN2.5um-25

€1,358.80 €1,616.97
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 1 Layer, 25 pieces

E1GOSiN2.5um-25

€1,404.10 €1,670.88
TEM Grids, Graphene Oxide on Silicon Nitride with 2.5µm holes, 2 Layer, 5 pieces

E2GOSiN2.5um-5

€398.20 €473.86

Product Details

Description

Thin mono layers of graphene oxide are created by oxidizing graphene layer using a proprietary oxidation process.

Characteristics

  • Two thicknesses of graphene oxide available: 1 or 2 layers
  • Substrate is a 200nm thin silicon nitride film with approx. 6400 2.5µm sized holes on a 200µm thick 3.0mm hexagonal silicon substrate with 0.5x0.5mm aperture
  • Graphene oxide coverage about 70%
  • Graphene Oxide film is hydrophilic and therefore more suitable for life science applications

 

Specifications

Type Graphene Oxide Thickness* Substrate Support Film
1 Layer 0.8-1.2nm Silicon, AP 0.5x0.5mm Silicon Nitride 2.5µm holes
2 Layer 1 - 1.5nm Silicon, AP 0.5x0.5mm Silicon Nitride 2.5µm holes

*Measured by EELS

More Information

More Information
Coating
Graphene Oxide
Film Thickness 0,8 - 1,5nm
Material
Silicon Nitride
Material Symbol Si
Mesh Style
single Hole
Manufacturer
EMS