TEM Grids with Support Film

These TEM grids are coated with 2-3-layers of unsupported Graphene film which covers almost 100% of the grid. The stable and clean continuous film provides a large area for viewing deposited materials and allows for good sample preparation.

A thin film of pure formvar resin. The thickness range is as follows:

• Standard: Approx. 10nm
• Ultra-Thin (UL): 5-6nm
• Thick (TH): 15-20nm
• Extra Thick (ET): 25-50nm

Ultra-thin Graphene Oxide (GO) films offer new potentials for TEM applications compared to existing film coatings. With GO monolayers the background contrast can be decreased to less than half of that of ultra-thin carbon films enabling an increased resolution for TEM.

Ultra-thin Graphene Oxide (GO) films offer new potentials for TEM applications compared to existing film coatings. With GO monolayers the background contrast can be decreased to less than half of that of ultra-thin carbon films enabling an increased resolution for TEM.

Ultra-thin Graphene Oxide (GO) films offer new potentials for TEM applications compared to existing film coatings. With GO monolayers the background contrast can be decreased to less than half of that of ultra-thin carbon films enabling an increased resolution for TEM.

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm