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Continuous Silicon Nitride Film TEM Window Grids, square/slots

Silicon frames are 100µm thick. Grids fit standard 3mm holders and most double tilt holders.
Thicknesses available are 5, 10, 15, 20, 30, 50, 100 and 200 nm, window sizes are squares of 0,01mm, 0,025, 0,05, 0,1, 0,15, 0,25, 0,5, 1mm or arrays.

Grouped product items
Product Name Qty
SiN TEM Window Grids, 8x 0,1mm squares, 1x 0,1x0,35mm slot, 20nm film, 10/pk

E76042-48

€292.00 €347.48
SiN TEM Window Grids, 8x 0,25mm squares, 1x 0,25x0,5mm slot, 10nm film, 10/pk

E76042-47

€292.00 €347.48
SiN TEM Window Grids, 8x 0,1mm squares, 1x 0,1x0,35mm slot, 10nm film, 10/pk

E76042-46

€292.00 €347.48
SiN TEM Window Grids, 8x 0,05mm squares, 1x 0,05x0,1mm slot, 5nm film, 10/pk

E76042-44

€446.90 €531.81

Product Details

Description

Features

  • Plasma Cleanable - can be vigorously plasma cleaned to remove organic contamination
  • High Temperature Tolerance - resist temperatures up to and above 1000°C
  • Mechanical Robustness - withstand harsh conditions
  • Flat, insulating and hydrophobic - incorporates LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride
  • Chemically Inert - resistant to bases, acids (except HF) and solvents
  • High Beam Current Tolerant
  • Carbon-Free and Ultra-Clean
  • Good X-ray transmission performance
  • Compatible - fit standard 3mm TEM grid holders, octagonal shape

 

Uses:

  • Environmental TEM (dynamic processes at high temperatures)
  • Nanoparticle imaging
  • Analysis of nano materials, semiconductor materials, optic-crystal materials, functional film materials etc.
  • (Quantitative) Carbon Analysis (photoresist, polymers, food, oil, fuel etc.)
  • Crystal growth research
  • X-Ray microscopy and X-Ray spectroscopy techniques
  • Thin film research
  • In-situ characterization of chemical reactions and annealing effects
  • Biological sample observation thanks to superior biocompatibility: on-film growth of cells or other biological samples
  • Characterization experiments of colloids, aerogels, organic materials and nanoparticles

Recommended Use

  SiN film thickness Product examples and window sizes

Highest Resolution Imaging

5nm E76042-43, 1 square (0,025mm)
E76042-44, 8 squares (0,05mm), 1 slot (0,05x0,1mm)
E76042-45, 2 slots (0,05x1,5mm)*
High Resolution 10nm E76042-46, 8 squares (0,1mm), 1 slot (0,1x0,35mm)
E76042-47, 8 squares (0,25mm), 1 slot (0,25x0,5mm)
YSG010Z, 1 square (0,1mm)
YSG015Z, 1 square (0,15mm)
YSG025Z, 1 square (0,25mm)
YSG050Z, 1 square (0,5mm)
YSAR010Z, 9 squares (0,1mm)
Everyday Imaging 20nm YSG001AT, 1 square (0,01mm)
E76042-48, 8 squares (0,1mm), 1 slot (0,1x0,35mm)
E76042-49, 1 square (0,5mm)
E76042-50, 9 squares (0,1mm)
Demanding Conditions 50nm E76042-53, 1 square (0,1mm)
E76042-52, 1 square (0,5mm)
E76042-51, 1 square (1mm)
YSTA015C, 2 slots (0,1x1,5mm)
E76042-50, 9 squares (0,1mm)
Suspension Materials & Cryo-TEM Microporös, nanoporös E76042-41, 1 square (0,5mm)
E76042-40, 1 square (0,5mm)
YSME050B, 1 square (0,5mm), 2,8μm holes
YSME050C, 1 square (0,5mm), 2,0μm holes
YSME050C10, 1 square (0,5mm), 10μm holes
YSME050E05, 1 square (0,5mm), 5μm holes
YSNP-TE025B, 1 square (0,25mm), 20-200nm holes, 50nm SiN
YSNP-TE010D, 1 square (0,1mm), 20-200nm holes, 200nm SiN

*Coated with 1nm ultrahigh purity carbon to minimize charging 

More Information

More Information
Film Type
Continuous SiN film
Material
Silicon Nitride