Silicon Nitride (SiN) TEM Window Grids feature robust, flat and uniform silicon nitride membranes that are widely used as stable observation platforms for TEM, SEM, Cryo-EM, AFM, Raman, XRD and other devices.
Applications include nano particle imaging, quantitative carbon analysis, biological and chemical experiments, crystal growth research and many more.
SiN TEM Window Grids perform well even under harsh lab conditions and thus provide an ideal balance of imaging resolution, chemical stability and mechanical strength. Since they are also highly temperature resistant, e.g. nanotechnology experiments can be performed on the membrane itself over wide temperature ranges.
Silicon frames are 100µm or 200µm thick. Grids fit standard 3mm holders and most double tilt holders.
SiN thicknesses available: 15, 20, 30, 50, 100 and 200nm.
Nanoporous SiN with holes from 20-200nm and SiN thicknesses of 15, 20, 30, 50, 100 or 200nm.