+49 (089) 18 93 668 0 - Info@ScienceServices.de   We are here for you! Call us or request a call back here.
Language

Nanoporous Silicon Nitride Film TEM Window Grids

Nanoporous SiN TEM Windows feature a range of different pore sizes (20-200nm) on a square silicon nitride membrane. This enables observation in the TEM without background noise. SiN film thicknesses of 15, 20, 30, 50, 100 or 200nm available.

Grouped product items
Product Name Qty
SiN TEM Membranes, nanoporous, 0,5mm window, 20nm film, 10/pk

E76042-42

Product Details

Description

Features

  • Plasma Cleanable - can be vigorously plasma cleaned to remove organic contamination
  • High Temperature Tolerance - resist temperatures up to and above 1000°C
  • Mechanical Robustness - withstand harsh conditions
  • Flat, insulating and hydrophobic - incorporates LPCVD, low-stress(~250MPa), non-stoichiometric silicon nitride
  • Chemically Inert - resistant to bases, acids (except HF) and solvents
  • High Beam Current Tolerant
  • Carbon-Free and Ultra-Clean
  • Good X-ray transmission performance
  • Compatible - fit standard 3mm TEM grid holders, octagonal shape
  • Field to Field Uniformity - less than 0.5 nm variation in film thickness across an entire production log, not just a single window grid

 

Uses:

  • Environmental TEM (dynamic processes at high temperatures)
  • Nanoparticle imaging
  • Analysis of nano materials, semiconductor materials, optic-crystal materials, functional film materials etc.
  • (Quantitative) Carbon Analysis (photoresist, polymers, food, oil, fuel etc.)
  • Crystal growth research
  • X-Ray microscopy and X-Ray spectroscopy techniques
  • Thin film research
  • In-situ characterization of chemical reactions and annealing effects
  • Biological sample observation thanks to superior biocompatibility: on-film growth of cells or other biological samples
  • Characterization experiments of colloids, aerogels, organic materials and nanoparticles

Recommended Use

  SiN film thickness Product examples and window sizes

Highest Resolution Imaging

5nm E76042-43, 1 square (0,025mm)
E76042-44, 8 squares (0,05mm), 1 slot (0,05x0,1mm)
E76042-45, 2 slots (0,05x1,5mm)*
High Resolution 10nm E76042-46, 8 squares (0,1mm), 1 slot (0,1x0,35mm)
E76042-47, 8 squares (0,25mm), 1 slot (0,25x0,5mm)
YSG010Z, 1 square (0,1mm)
YSG015Z, 1 square (0,15mm)
YSG025Z, 1 square (0,25mm)
YSG050Z, 1 square (0,5mm)
YSAR010Z, 9 squares (0,1mm)
Everyday Imaging 20nm YSG001AT, 1 square (0,01mm)
E76042-48, 8 squares (0,1mm), 1 slot (0,1x0,35mm)
E76042-49, 1 square (0,5mm)
E76042-50, 9 squares (0,1mm)
Demanding Conditions 50nm E76042-53, 1 square (0,1mm)
E76042-52, 1 square (0,5mm)
E76042-51, 1 square (1mm)
YSTA015C, 2 slots (0,1x1,5mm)
E76042-50, 9 squares (0,1mm)
Suspension Materials & Cryo-TEM Microporös, nanoporös E76042-41, 1 square (0,5mm)
E76042-40, 1 square (0,5mm)
YSME050B, 1 square (0,5mm), 2,8μm holes
YSME050C, 1 square (0,5mm), 2,0μm holes
YSME050C10, 1 square (0,5mm), 10μm holes
YSME050E05, 1 square (0,5mm), 5μm holes
YSNP-TE025B, 1 square (0,25mm), 20-200nm holes, 50nm SiN
YSNP-TE010D, 1 square (0,1mm), 20-200nm holes, 200nm SiN

*Coated with 1nm ultrahigh purity carbon to minimize charging 

More Information

More Information
Film Type
Nanoporous SiN film
Material
Silicon Nitride