TEM Grids with Support Film

Ultra-thin Graphene Oxide (GO) films offer new potentials for TEM applications compared to existing film coatings. With GO monolayers the background contrast can be decreased to less than half of that of ultra-thin carbon films enabling an increased resolution for TEM.

Ultra-thin Graphene Oxide (GO) films offer new potentials for TEM applications compared to existing film coatings. With GO monolayers the background contrast can be decreased to less than half of that of ultra-thin carbon films enabling an increased resolution for TEM.

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

A thin film of pure carbon deposited on one side of the grid. Mechanically not as stable as formvar films, but show better electrical and heat conduction in the electron beam. The thickness range is as follows:

• Standard: Approx. 5-6nm
• Ultra-Thin (UL): 3-4nm
• Thick (TH): 10nm
• Extra Thick (ET): 20-30nm

Graphene is a single atomic layer of carbon atoms tightly packed in a two-dimensional honeycomb lattice. Graphene is the ideal support film for electron microscopy.

Please note: Graphene grids films have a shelf-life of 45 days only! The graphen film covers only small parts of the open area of the grid.